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PVD MF / DC Magnetron Sputtering Machine On Flatware , Stainless Steel Electronic Components

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PVD MF / DC Magnetron Sputtering Machine On Flatware , Stainless Steel Electronic Components

Brand Name : ROYAL

Model Number : RTAC1250-SPMF

Certification : CE certification

Place of Origin : Made in China

MOQ : 1 set

Price : negotiable

Payment Terms : L/C, D/A, D/P, T/T

Supply Ability : 6 sets per month

Delivery Time : 12 weeks

Packaging Details : Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.

Deposition Sources : Steered Cathodic Arc + MF Sputtering Cathode

Technique : PVD, Balanced/Unbalanced Magentron Sputtering Cathode

PVD Plating Properties : High wear resistance, High hardness at high operating temperatures, High oxidation resistance Low friction Anti-sticking Scratch resistant, Brilliant finish in specified colors

Equipment Feature : Reliable, Flexible, stable, robust design, high yield, fast cycle time, large batch capacity

Factory Location : Shanghai city, China

Worldwide Service : Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America

Training Service : Machine operation, maintenance, coating process Recipes, program

Warranty : Limited warranty 1 year for free, whole life for machine

OEM & ODM : available, we support tailor made design and fabrication

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PVD MF / DC Magnetron Sputtering Machine On Flatware , Stainless Steel Electronic Components

MF/DC Magnetron Sputtering Deposition Equipment, PVD Sputtering on Flatware, Stainless steel electronic components

Summary: PVD arc evaporation perfectly combined with MF sputtering technology, generate the high end quality functional and aesthetic coatings on products surface.

Why MF Sputtering?
Compared with DC and RF sputtering, Mid-Frequency sputtering has become a main thin film sputtering technique for mass production of coating, particularly for the film deposition of dielectric and non-conductive film coatings on surfaces such as optical coatings, solar panels, multiple layers, composite material film etc.
It is replacing RF sputtering due to it operated with kHz rather than MHz for a much faster deposition rate and also can avoid the Target poisoning during compound thin film deposition like DC.

MF sputtering targets always existed with two-sets. Two cathodes are used with an AC current switched back and forth between them which cleans the target surface with each reversal to reduce the charge build up on dielectrics that leads to arcing which can spew droplets into the plasma and prevent uniform thin film growth--- which is what we called Target Poisoning.


With MF sputtering system, we can get graphite color, the LAB data: ( L: 30~35). A:-0.04, B:08

Key Words: Consumer Electronics PVD Decorative Coating, Stainless Steel Flatware PVD decoration,

Pearl high glossary PVD coating, finger ring black plating, medical instrument DLC coating,

Corrosion and wear resistance PVD films, high vacuum metalizer.

Royal Technology has developed 3 standardized Machines for different capacity to satisfy our customer’s demand and applications.

Stainless Steel PVD Plating Machine Technical Specification
Model RTAC1008-SPMF RTAC1250-SPMF RTAC1612-SPMF
Effective Chamber Size Φ1000 x H800mm Φ1250 x H1250mm Φ1600 x H1200mm
Deposition Sources

Cylinder Arc (steered circular arc for option) +MF Sputtering Cathode +

Linear Ion Source

Vacuum Pumping System ( Leybold Pumps + Turbo Molecular Pump)

 SV300B - 1 set (300m³/hr) SV300B - 1 set (300m³/hr) SV300B - 2 set (300m³/hr)

WAU1001-1set

(1000m³/hr)

WAU1001-1set

(1000m³/hr)

WAU2001-1set

(1000m³/hr)
D60T- 1 set (60m³/hr) D60T- 1 set (60m³/hr) D60T- 1 set (60m³/hr)

Turbo Molecular Pumps:

2 sets (3500L/S)

Turbo Molecular Pumps:

2 sets (3500L/S)

Turbo Molecular Pumps:

3 sets (3500L/S)
Sputtering Power Supply 1*24KW (MF) 2*36KW(MF) 3*36KW(MF)
Arc Power Supply 6*5KW 7*5KW 8*5KW
Bias Power Supply 1*24KW 1*36KW 1*36KW
Planetary Rods 6/8 12/16 20
Heaters 6*2.5KW 8*2.5KW 9*2.5KW
Ultimate Vacuum 9.0*10-4Pa (empty, clean,room temperature) 9.0*10-4Pa (empty, clean,room temperature) 9.0*10-4Pa (empty, clean,room temperature)
Cycle Time (depends on pump) 40’~50’ depends on substrate material and coating recipes
Working Power Requirement 3Phase 4 lines,AC380V,50HZ,35KW 3Phase 4 lines,AC380V,50HZ,120KW 3Phase 4 lines,AC380V,50HZ,150KW
Cooling Water YES, industrial water chiller
Processing Gas (99.99%) 4 ways 4 ways 4 ways
Footprint (mm) 2000*2000*2300 4000*4500*3200 5500*5000*3600
Total Weight(KGS) 4500 7000 9000
Total Power Consumption(Approx.) 50KW 110KW 170KW
Actual Power Consumption(Approx.) 30KW 60KW 80KW

Above technical parameters only for reference, Royal Technology reserves the right for final production based on specified applications. We provide you not only the coating machine but the total coating solutions, turnkey-project service is available.

Coating Samples:

PVD MF / DC Magnetron Sputtering Machine On Flatware , Stainless Steel Electronic Components

PVD MF / DC Magnetron Sputtering Machine On Flatware , Stainless Steel Electronic Components

PVD MF / DC Magnetron Sputtering Machine On Flatware , Stainless Steel Electronic Components

Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.


Product Tags:

magnetron sputtering machine

      

vacuum deposition equipment

      
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