CsI Thin Film Deposition Vacuum Coating Machine / Cesium Iodide Thin Film Thermal Evaporation Coating Equipment
Cesium Iodide Thin Film Thermal Evaporation Coatings performance
Ultra- High Spatial Resolution of Imagings;
Fast response for sharper imagings;
Class leading edge-to-edge image areas;
Optical absorber layers or reflector layers;
Low patient X-ray dose;
Suitable for CMOS and CCD devices, especially in medical industries.
CsI Thin Film Deposition Vacuum Coating Machine for CMOS CCD devices is an advanced technique to evaporate CsI on the screen to give a high quality.
Efficiency:
CsI-950A+ model is with 2-rotary rack structure based on Generation -one CsI-950 model.
Double-capacity for max. size substrate: 500 x400mm.
Reliability:
24/7 days non-stop operation;
Inficon Film Thickness Controller to monitor the film thickness inline.
Temperature control accuracy: ±1 ℃, multi-stage setting, automatic temperature data recording and control
Rotary racks equipped with Servo-Motor for high accuracy and stability.
Repeatability & Reproducibility:
Through high precised parameter control system,
Automated process control software and program,
User friendly operation.
Safety:
High vacuum pump: Magnetic Suspension Molecular Pump, with nitrogen gas blowing device to avoid hazard material be exposed in the air;
All electrodes are equipped with safety protection sleev
CsI High Vacuum Deposition System is exclusively designed for CsI metallization on scintillation screens in an extremely high vacuum environment. The CsI scintillators 200～600µm in thickness ranges with high uniformity of thickness and brightness performance.
Cesium Iodide (CsI ) Deposition characterizations:
Ultra- High Spatial Resolution of Imaging;
Fast response for sharper imaging;
Class leading edge-to-edge image areas;
Optical absorb layers or reflector layers;
Low patient X-ray dose;
Application: for security check and inspection, high energy physics education, nuclear radiaton detection and medical imagings: chest examination, mamography, dental inter oral and panoramic.
Substrates Applied: TFT glass, Fiber Optic Plate, Amorphous-carbon plate, Aluminum plate
| Description |
CsI-950 |
CsI-950A+
|
|
Deposition chamber (mm)
|
φ950 x H1350 |
φ950 x H1350
|
| Loading rotary racks |
1 |
2 |
| Evaporation sources |
2 |
2
|
| Heating method |
Iodine tungsten lamp
Max. 800℃
|
Iodine tungsten lamp
Max. 800℃
|
| Ultimated vacuum pressure (Pa) |
8.0×10-5Pa |
8.0×10-5Pa |
| Magnetic Suspension Molecular Pump |
1 x 3400L/S |
1 x 3400L/S
|
| Roots Pump |
1 x 490m³/h |
1 x 490m³/h
|
| Rotary Vane Pump |
1 x 300m³/h |
1 x 300m³/h
|
| Deposition Controller |
Quartz Control x 1 |
Quartz Control x 1
|
| Power Consumption (KW) |
Max. approx. 62
Average approx. 32
|
Max. approx. 65
Average approx. 35
|
Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.
Product Tags:
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Crucible Evaporation Coating Equipment, Cesium Iodide Thin Film Deposition Systems Images
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